Super God-Level Top Student

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Optimistically, the two difficult problems that needed to be solved were both his strengths.

Through a rigorous physics knowledge system, he would deduce and design a new light source and lithography pattern, and use scientific language to persuade everyone to believe in the illusion that Huaxia could bypass all industrial manufacturing difficulties and so-called patent restrictions to produce lithography equipment that could rival the latest generation of Extreme Ultraviolet Lithography Machines.

Then, by fabricating a series of laboratory data, he would make the outside world believe that some major university in Huaxia had already started research on this project, and had made great progress, even possibly producing such machines within a few years.

As long as he could actually do these two things, coupled with his understanding of Western development history from yesterday, as well as the sales strategies and decision-making orientations of those semiconductor technology companies, he was almost certain that those high-and-mighty companies would find every possible way to proactively break the so-called ban and deliver those technologies to Huaxia.

They might even be willing to voluntarily give up part of their profits to quickly capture the Huaxia market.

Of course, even if he didn't achieve this effect, he wouldn't be discouraged.
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Scaring the other side was good enough.

Even if he didn't manage to scare them, Qiao Ze didn't care.

After all, he hadn't spent much effort and time on it, and it was just something he did by the way, like practicing writing by drafting a paper.

After all, Youwei could now be considered his partner, and doing something for a partner was mutually beneficial.

And as long as he didn't claim that these data were actually measured in the laboratory, it wasn't fabrication. All he had to do was replace all terms with theory and speculation, and that was it. This wouldn't violate the fundamental academic ethical standards, and what others would think or assume was their business.

Indeed, this was exactly what Qiao Ze thought: simple, direct, and using his best abilities to try and solve some problems.

As for truly entering the chip industry?

What a joke!

Qiao Ze admitted that even if he were really sick, he wouldn't be that sick.

Of course, fooling journal editors and professionals was naturally extremely difficult.

Therefore, plausibility was the focus of Qiao Ze's considerations.

In his design, the new light source would be powered by a particle accelerator, providing a stable high-energy light source for the lithography machine.

The scientific language description is that when charged particles traveling near the speed of light move along a curved path under the influence of an electromagnetic field, they emit electromagnetic radiation. Put in layman's terms, when electrons move at the speed of light in a circular track, they always emit photons tangentially.

The emitted electromagnetic waves actually have the features of high brightness and a wide spectrum.

Especially the wide spectrum, ranging from infrared to visible light to ultraviolet, extreme ultraviolet, and even X-rays, which can all be created by controlling the speed of the particle's rotation in the ring.

So theoretically, only a certain wavelength of laser is needed to manipulate the electron beam located in the storage ring, making it rotate. Afterwards, the electrons would theoretically be confined within the optical potential well formed by the laser, becoming a stable micro-beam.

When this micro-beam exists within the range of the laser wavelength, it could emit a high-intensity, narrow-bandwidth coherent light source.

According to previous theories, this kind of light possesses high average power, high repetition frequency, and a wide wavelength range.

The EUV light source used by ASML's latest generation lithography machines is also included, of course, as are the iterative predecessors, the UV and DUV light sources.

Beyond that, there's the light delivery system, the arrangement of various components, and so on.

In Qiao Ze's design, the large lithography machine would require a large, multi-layered storage ring with a circumference of about fifty meters, which could, under the operation of the laser beam, simultaneously emit twenty-eight different wavelengths and powers of light sources, that then enter other parts through different pathways to begin micro-engraving on the wafers.

To make the paper look more authentic, Qiao Ze felt he needed to spend some time designing an intelligent control system framework that could simultaneously control twenty-eight light sources, essentially creating software adaptation for this device that, for now, didn't yet exist in the world.

This also led to the paper taking a bit longer to complete. He had conceived part of it last night, started writing in the morning, and continued until 10 pm, with the first paper still not fully written.

The difficulty was mainly focused on the conceptual data and the smart control system that Qiao Ze named "Light Sculpting KGWX1.0."

Fortunately, the entire project team didn't really care what Qiao Ze was doing at the moment.

When working on the Group Theory intelligent framework, there were points of discussion.

Now, with Qiao Ze's new topic, aside from Liu Chenfeng and Li Jiangao who could vaguely understand the problems he wanted to solve, everyone else didn't even quite understand the title.

Liu Chenfeng could only help Qiao Ze with some auxiliary tasks. After completing the tasks, he would take care of his own things.

But thinking that these two papers were not suitable for many people to see before publication, Qiao Ze still put passwords on the computer he used for writing papers and the server where the papers were stored. Eventually, it took Qiao Ze three days to finish this work.

After roughly understanding the impact of different journals and the focus of the selected papers, Qiao Ze decided to submit both papers to the "Science" magazine in the United States.

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